Etching hafnium with Multi-Etch

Melted tip of a hafnium consumable electrode, oxidized hafnium ebeam remelted ingot, and 1 cm³ hafnium cube. By Alchemist-hp (Free Art License).

How to etch hafnium with Multi-Etch, the safer alternative to hydrofluoric acid

Multi-Etch was originally developed for use on titanium, and is a perfect low-acid (pH 6.8) alternative to hazardous hydrofluoric (HF) acid for etching hafnium

                      
                          Etch rates for hafnium using Multi‑Etch
                        
                              Process
                            
                              Etch time (minutes)
                            
                              Etch depth (inches, cumulative total)
                            
                              Surface change
                            
                              150–160°F double strength
                            
                              1
                            
                              0.0006
                            
                              None
                            
                              2
                            
                              0.0015
                            
                              Matte, dark grey
                            
                              3
                            
                              0.002
                            
                              Matte, dark grey

Etch rates for hafnium using Multi‑Etch
Process	Etch time (minutes)	Etch depth (inches, cumulative total)	Surface change
150–160°F double strength
	1	0.0006	None
	2	0.0015	Matte, dark grey
	3	0.002	Matte, dark grey

Step-by-step guides on etching with Multi-Etch

The guides below demonstrate etching with titanium, but the order of steps are the same for etching hafnium.

Tips and tricks when etching with Multi-Etch

Ordering Multi-Etch

Multi-Etch can be ordered throughout the world!

Questions? You can contact Multi-Etch by phone or email.